-
1
-
-
0026173629
-
-
P. J. A. Thijs, L. F. Tiemeijer, K. I. Kuindersma, J. J. M. Binsma, and T. van Dongen, IEEE J. Quantum Electron. 27, 1426 (1991).
-
(1991)
IEEE J. Quantum Electron.
, vol.27
, pp. 1426
-
-
Thijs, P.J.A.1
Tiemeijer, L.F.2
Kuindersma, K.I.3
Binsma, J.J.M.4
Van Dongen, T.5
-
2
-
-
10044281804
-
-
M. Vanwolleghem, W. Van Parys, D. Van Thourhout, R. Baets, F. Lelarge, O. Gauthier-Lafaye, B. Thedrez, R. Wirix-Speetjens, and L. Lagae, Appl. Phys. Lett. 85, 3980 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 3980
-
-
Vanwolleghem, M.1
Van Parys, W.2
Van Thourhout, D.3
Baets, R.4
Lelarge, F.5
Gauthier-Lafaye, O.6
Thedrez, B.7
Wirix-Speetjens, R.8
Lagae, L.9
-
3
-
-
18444393745
-
-
F. Lelarge, B. Dagens, C. Cuisin, O. Le Gouezigou, G. Patriarche, W. Van Parys, M. Vanwolleghem, R. Baets, and J. L. Gentner, J. Cryst. Growth 278, 709 (2005).
-
(2005)
J. Cryst. Growth
, vol.278
, pp. 709
-
-
Lelarge, F.1
Dagens, B.2
Cuisin, C.3
Le Gouezigou, O.4
Patriarche, G.5
Van Parys, W.6
Vanwolleghem, M.7
Baets, R.8
Gentner, J.L.9
-
4
-
-
32944455094
-
-
W. Van Parys, B. Moeyersoon, D. Van Thourhout, R. Baets, M. Vanwolleghem, B. Dagens, J. Decobert, O. Le Gouezigou, D. Make, R. Vanheertum, and L. Lagae, Appl. Phys. Lett. 88, 071115 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 071115
-
-
Van Parys, W.1
Moeyersoon, B.2
Van Thourhout, D.3
Baets, R.4
Vanwolleghem, M.5
Dagens, B.6
Decobert, J.7
Le Gouezigou, O.8
Make, D.9
Vanheertum, R.10
Lagae, L.11
-
5
-
-
0030079777
-
-
M. Kondow, K. Uomi, A. Niwa, T. Kitatani, S. Wakahiki, and Y. Yazawa, Jpn. J. Appl. Phys., Part 1 35, 1273 (1996).
-
(1996)
Jpn. J. Appl. Phys., Part 1
, vol.35
, pp. 1273
-
-
Kondow, M.1
Uomi, K.2
Niwa, A.3
Kitatani, T.4
Wakahiki, S.5
Yazawa, Y.6
-
6
-
-
0000618497
-
-
W. Shan, W. Walukiewicz, J. W. Ager III, E. E. Haller, J. F. Geisz, D. J. Friedman, J. M. Olson, and S. R. Kurtz, Phys. Rev. Lett. 82, 1221 (1999).
-
(1999)
Phys. Rev. Lett.
, vol.82
, pp. 1221
-
-
Shan, W.1
Walukiewicz, W.2
Ager Iii, J.W.3
Haller, E.E.4
Geisz, J.F.5
Friedman, D.J.6
Olson, J.M.7
Kurtz, S.R.8
-
9
-
-
0035858305
-
-
M. Hofmann, A. Wagner, C. Ellmers, C. Schlichenmeier, S. Schafer, F. Hohnsdorf, J. Koch, W. Stolz, S. W. Koch, W. Ruhle, J. Hader, J. V. Moloney, E. P. O'Reilly, B. Borchert, A. Y. Egorov, and H. Riechert, Appl. Phys. Lett. 78, 3009 (2001).
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 3009
-
-
Hofmann, M.1
Wagner, A.2
Ellmers, C.3
Schlichenmeier, C.4
Schafer, S.5
Hohnsdorf, F.6
Koch, J.7
Stolz, W.8
Koch, S.W.9
Ruhle, W.10
Hader, J.11
Moloney, J.V.12
O'Reilly, E.P.13
Borchert, B.14
Egorov, A.Y.15
Riechert, H.16
-
11
-
-
0001300821
-
-
M. R. Gokhale, J. Wei, H. Wang, and S. R. Forrest, Appl. Phys. Lett. 74, 1287 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 1287
-
-
Gokhale, M.R.1
Wei, J.2
Wang, H.3
Forrest, S.R.4
-
13
-
-
0034292173
-
-
A. Ubukata, J. Dong, K. Matsumoto, and Y. Ishihara, Jpn. J. Appl. Phys., Part 1 39, 5962 (2000).
-
(2000)
Jpn. J. Appl. Phys., Part 1
, vol.39
, pp. 5962
-
-
Ubukata, A.1
Dong, J.2
Matsumoto, K.3
Ishihara, Y.4
-
14
-
-
79956029488
-
-
D. Serries, T. Geppert, P. Ganser, M. Maier, K. Köhler, N. Herres, and J. Wagner, Appl. Phys. Lett. 80, 2448 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2448
-
-
Serries, D.1
Geppert, T.2
Ganser, P.3
Maier, M.4
Köhler, K.5
Herres, N.6
Wagner, J.7
-
15
-
-
10844270581
-
-
K. Köhler, J. Wagner, P. Ganser, D. Serries, T. Geppert, M. Maier, and L. Kirste, IEE Proc.: Optoelectron. 151, 247 (2004).
-
(2004)
IEE Proc.: Optoelectron.
, vol.151
, pp. 247
-
-
Köhler, K.1
Wagner, J.2
Ganser, P.3
Serries, D.4
Geppert, T.5
Maier, M.6
Kirste, L.7
-
19
-
-
36448999401
-
-
X. Marie, J. Barrau, B. Brousseau, T. Amand, M. Brousseau, E. V. K. Rao, and F. Alexandre, J. Appl. Phys. 69, 812 (1991).
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 812
-
-
Marie, X.1
Barrau, J.2
Brousseau, B.3
Amand, T.4
Brousseau, M.5
Rao, E.V.K.6
Alexandre, F.7
-
20
-
-
17044367903
-
-
H. Carrere, X. Marie, J. Barrau, and T. Amand, Appl. Phys. Lett. 86, 071116 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 071116
-
-
Carrere, H.1
Marie, X.2
Barrau, J.3
Amand, T.4
-
21
-
-
0003601178
-
-
B. Grandidier, R. M. Feenstra, C. Silfvenius, and G. Landgren, J. Vac. Sci. Technol. A 17, 2251 (1999).
-
(1999)
J. Vac. Sci. Technol. A
, vol.17
, pp. 2251
-
-
Grandidier, B.1
Feenstra, R.M.2
Silfvenius, C.3
Landgren, G.4
-
22
-
-
0242580636
-
-
A. Erol, S. Mazzucato, M. C. Arikan, H. Carrere, A. Arnoult, E. Bedel, and N. Balkan, Semicond. Sci. Technol. 18, 968 (2003).
-
(2003)
Semicond. Sci. Technol.
, vol.18
, pp. 968
-
-
Erol, A.1
Mazzucato, S.2
Arikan, M.C.3
Carrere, H.4
Arnoult, A.5
Bedel, E.6
Balkan, N.7
-
23
-
-
0000578107
-
-
I. A. Buyanova, W. M. Chen, B. Monemar, H. P. Xin, and C. W. Tu, Appl. Phys. Lett. 75, 3781 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 3781
-
-
Buyanova, I.A.1
Chen, W.M.2
Monemar, B.3
Xin, H.P.4
Tu, C.W.5
-
25
-
-
0032022187
-
-
E. V. K. Rao, A. Ougazzaden, Y. Le Bellego, and M. Juhel, Appl. Phys. Lett. 72, 1409 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 1409
-
-
Rao, E.V.K.1
Ougazzaden, A.2
Le Bellego, Y.3
Juhel, M.4
-
26
-
-
22644450004
-
-
X. Yang, J. B. Heroux, M. J. Jurkovic, and W. I. Wang, J. Vac. Sci. Technol. B 17, 1144 (1999).
-
(1999)
J. Vac. Sci. Technol. B
, vol.17
, pp. 1144
-
-
Yang, X.1
Heroux, J.B.2
Jurkovic, M.J.3
Wang, W.I.4
-
29
-
-
0345631406
-
-
J. Barrau, T. Amand, M. Brousseau, R. J. Simes, and L. Goldstein, J. Appl. Phys. 71, 5768 (1992).
-
(1992)
J. Appl. Phys.
, vol.71
, pp. 5768
-
-
Barrau, J.1
Amand, T.2
Brousseau, M.3
Simes, R.J.4
Goldstein, L.5
|