Composition and stress fields in undulated Si 0.7 Ge 0.3 Si (100) thin films

Journal of Applied Physics

Volumn 100, Issue 8, 2006, Pages

  Wu, Chi Chin ^a   Hull, Robert ^a  

^a University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION SEGREGATION; QUANTITATIVE CORRELATION; REDISTRIBUTED STRESSES; UNDULATED EPITAXIAL FILMS;

ANISOTROPY; CORRELATION METHODS; EPITAXIAL GROWTH; ETCHING; FINITE ELEMENT METHOD; SEGREGATION (METALLOGRAPHY); SURFACE ROUGHNESS; THIN FILMS;

SILICON COMPOUNDS;

EID: 33750568388     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2360785     Document Type: Article

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