Tribological performance of sulfonamide derivatives as lubricating oil additives in the diester

Journal of Synthetic Lubrication

Volumn 23, Issue 4, 2006, Pages 211-221

  Wu, H ^a   Ren, T H ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Anti wear; Diester; Friction reduction; Scanning electron microscopy; Sulfonamide derivatives; X ray photoelectron spectroscopy

Indexed keywords

FRICTION; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY; SYNTHETIC LUBRICANTS; TRIBOLOGY; WEAR OF MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIESTER; FRICTION REDUCTION; SULFONAMIDE DERIVATIVES;

LUBRICATING OILS;

FRICTION; LUBRICATING OILS; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY; SYNTHETIC LUBRICANTS; TRIBOLOGY; WEAR OF MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33750532756     PISSN: 02656582     EISSN: None     Source Type: Journal    
DOI: 10.1002/jsl.23     Document Type: Article

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