Self-assembled multilayer film formed by alternating layers of H 4SiW12O40 and a dipolar Ru(II) complex

Acta Chimica Sinica

Volumn 62, Issue 7, 2004, Pages 738-741

  Zhang, Yu Qi ^a   Gao, Li Hua ^b   Duan, Zhi Ming ^a   Wang, Ke Zhi ^a   Wang, Ye Liang ^c   Gao, Hong Jun ^c  

^a BEIJING NORMAL UNIVERSITY   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

^c INSTITUTE OF PHYSICS   (China)

Author keywords

Ruthenium(II) complex; Self assembled film; Silicotungstic acid

Indexed keywords

EID: 33750495867     PISSN: 05677351     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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