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Volumn 223, Issue 3, 2006, Pages 224-226
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Interfacial reactions and silicate formation in highly dispersed Lu 2O3 - SiO2 system
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Author keywords
Lu 2O3; Lu2Si2O7; Lutetium silicate; Microstructure; SiO2 reaction; TEM
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Indexed keywords
AMORPHOUS SILICON;
BINARY ALLOYS;
DYSPROSIUM COMPOUNDS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
INTERFACE STATES;
LUTETIUM COMPOUNDS;
SILICATES;
SOLID STATE REACTIONS;
X RAY POWDER DIFFRACTION;
BINARY OXIDE SYSTEMS;
HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
HIGHEST TEMPERATURE;
INTERFACE REACTIONS;
LU 2O3;
LUTETIUM SILICATE;
SI LAYER;
SILICATE FORMATION;
SIO2 REACTION;
TEM;
SILICA;
LUTETIUM OXIDE;
NANOPARTICLE;
OXIDE;
SILICON OXIDE;
UNCLASSIFIED DRUG;
CHEMICAL REACTION;
CONFERENCE PAPER;
DISPERSION;
HIGH TEMPERATURE;
PRIORITY JOURNAL;
SOLID STATE;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY POWDER DIFFRACTION;
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EID: 33750225140
PISSN: 00222720
EISSN: 13652818
Source Type: Journal
DOI: 10.1111/j.1365-2818.2006.01625.x Document Type: Conference Paper |
Times cited : (4)
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References (12)
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