High-rate sputtering of thick PZT layers for MEMS actuators

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn 2006, Issue , 2006, Pages 214-217

  Jacobsen, H ^a   Quenzer, H J ^a   Wagner, B ^a   Ortner, K ^b   Jung, Th ^b  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; MICROELECTROMECHANICAL DEVICES; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SPUTTERING; SUBSTRATES; THIN FILMS;

FERROELECTRIC HYSTERESIS; GAS FLOW SPUTTERING; POLYCRYSTALLINE LEAD ZIRCONATE TITANATE (PZT); SILICON SUBSTRATES;

ACTUATORS;

EID: 33750131681     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.2006.1627774     Document Type: Conference Paper

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