Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography

Journal of the Electrochemical Society

Volumn 153, Issue 9, 2006, Pages

  Chen, H L ^a   Fan, Wonder ^b   Cheng, C C ^c   Lin, C H ^b   Huang, K T ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL FIBER FABRICATION; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; REFLECTION; TEXTURES;

ANTIREFLECTIVE PYRAMID STRUCTURES; DEFOCUSING EXPOSURE; OPTICAL STEPPER; TEXTURING ANTIREFLECTION STRUCTURES;

SOLAR CELLS;

EID: 33750094180     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2213567     Document Type: Article

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