Fabrication of thick silicon dioxide air-bridge for RF application using micromachining technology

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 202-203

  Park, Jeong Yong ^a   Sim, Jun Hwan ^b   Shin, Jang Kyoo ^a   Lee, Jong Hyun ^a  

^a Kyungpook National University   (South Korea)

^b Korea Maritime University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; COMPOSITE MICROMECHANICS; DIELECTRIC DEVICES; DIELECTRIC LOSSES; FABRICATION; MICROMACHINING; NANOTECHNOLOGY; SILICA; SURFACE MICROMACHINING;

ANODIC REACTIONS; HIGH THERMAL CONDUCTIVITY; LOW-RESISTIVITY SILICON SUBSTRATE; MICROMACHINING TECHNOLOGIES; MICROWAVE SUBSTRATES; OPERATING FREQUENCY; PASSIVE ELEMENTS; SURFACE MICROMACHINING PROCESS;

SUBSTRATES;

EID: 33750084138     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984160     Document Type: Conference Paper

References (3)

1. A. Rosen et al., "Silicon as a millimeter-wave monolithically intergrated substrate-A new look," RCA Rwv., vol pp. 633-660, 1981.
2. J. Bruechler et al., "Silicon high-resistivity-substrate milliter-wave technology," IEEE Trans. Microwave Theory Tech., vol. MTT-34, pp.1516-1521, Dec. 1986.
3. K. J. Herrick, Thomas A. Schwarz, and Linda P. B et al., "Si-Micromachined Coplanar Waveguides for Use in High-Frequency Circuits" IEEE Trans. Microwave Theory Tech., vol. 46. Pp. 762-767, June. 1998.