Role of Al2O3 layer in oxidation resistance of Cu-Al dilute alloys pre-annealed in H2 atmospheres

Corrosion Science

Volumn 48, Issue 11, 2006, Pages 3692-3702

  Hong, Sang Hwui ^a   Zhu, Yongfu ^a   Mimura, Kouji ^a   Isshiki, Minoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Cu Al alloy; Diffusion; Oxidation kinetic; Oxidation resistance; Secondary ion mass spectroscopy (SIMS); Surface Al2O3 layer

Indexed keywords

ANNEALING; ATMOSPHERIC CORROSION; DIFFUSION; OXIDATION RESISTANCE; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY;

OXIDATION KINETICS; SURFACE AL2O3 LAYER;

COPPER ALLOYS;

ANNEALING; ATMOSPHERIC CORROSION; COPPER ALLOYS; DIFFUSION; OXIDATION RESISTANCE; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY;

EID: 33750064561     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2006.02.009     Document Type: Article

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