An economic, environment-friendly oxygen-hydrochloric acid regeneration system for ferric chloride etchants used in photochemical machining

CIRP Annals - Manufacturing Technology

Volumn 55, Issue 1, 2006, Pages 205-208

  Allen, D M ^a   Jefferies, P ^b  

^a CRANFIELD UNIVERSITY   (United Kingdom)

^b Tecan Components Ltd   (United Kingdom)

Author keywords

Environmental; Etching; Photochemical machining

Indexed keywords

CHEMICAL FINISHING; COST EFFECTIVENESS; HYDROCHLORIC ACID; MACHINING; PH EFFECTS;

ENVIRONMENTAL FRIENDLY METHODS; ETCHANT PARAMETERS; ETCHING LINE; PHOTOCHEMICAL MACHINING;

ETCHING;

EID: 33750053311     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)60399-0     Document Type: Article

References (22)

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