Influence of hydrogen on the growth of FePt thin films

Journal of Applied Physics

Volumn 100, Issue 7, 2006, Pages

  Maass R ^a   Weisheit, M ^a   Fahler S ^a   Schultz, L ^a  

^a Institute for Metallic Materials   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY FIELD; GAS ATMOSPHERE; PRESSURE DEPENDENCE;

ATMOSPHERIC PRESSURE; COERCIVE FORCE; FILM GROWTH; HYDROGEN; IRON COMPOUNDS; NUCLEATION;

THIN FILMS;

EID: 33750027703     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357643     Document Type: Article

References (28)

1. R. F. C. Farrow, D. Weller, R. F. Marks, M. F. Toney, S. Hom, G. R. Harp, and A. Cebollada, Appl. Phys. Lett. 0003-6951 10.1063/1.117383 69, 1166 (1996).
2. J.-U. Thiele, L. Folks, M. F. Toney, and D. K. Weller, J. Appl. Phys. 0021-8979 10.1063/1.368831 84, 5686 (1998).
3. M. -G. Kim, S. -C. Shin, and K. Kang, Appl. Phys. Lett. 80 (20), 3802 (2002).
4. C. L. Platt, K. W. Wierman, E. B. Svedberg, R. van de Veerdonk, J. K. Howard, A. G. Roy, and D. E. Laughlin, J. Appl. Phys. 0021-8979 10.1063/1.1516870 92, 6104 (2002).
5. M. H. Hong, K. Hono, and M. Watanabe, J. Appl. Phys. 0021-8979 10.1063/1.368662 84, 4403 (1998).
6. T. Shima, K. Takanashi, Y. K. Takahashi, and K. Hono, Appl. Phys. Lett. 0003-6951 10.1063/1.1498504 81, 1050 (2002).
7. M. Weisheit, L. Schultz, and S. Fähler, J. Appl. Phys. 0021-8979 10.1063/1.1667456 95, 7489 (2004).
8. C. P. Luo and D. J. Sellmeyer, IEEE Trans. Magn. 0018-9464 10.1109/20.490144 31, 2764 (1995).
9. Y. K. Takahashi, M. Ohnuma, and K. Hono, J. Magn. Magn. Mater. 0304-8853 10.1016/S0304-8853(02)00065-3 246, 259 (2002).
10. K. W. Wierman, C. L. Platt, and J. K. Howard, J. Magn. Magn. Mater. 0304-8853 10.1016/j.jmmm.2003.12.1387 278, 214 (2004).
11. Y.-N. Hsu, S. Jeong, D. E. Laughlin, and D. N. Lambeth, J. Appl. Phys. 0021-8979 10.1063/1.1360683 89, 7068 (2001).
12. H. Noh, J. D. Clewley, and T. B. Flanagan, Scr. Mater. 34, 665 (1996).
13. T. B. Flanagan, A. P. Craft, T. Kuji, K. Baba, and Y. Sakamoto, Scr. Metall. 0036-9748 10.1016/0036-9748(86)90281-4 20, 1745 (1986).
14. S. Farrow and R. Marks, U.S. Patent 5,792,510 (1998).
15. K. Leistner, J. Thomas, H. Schlörb, M. Weisheit, L. Schultz, and S. Fähler, Appl. Phys. Lett. 0003-6951 10.1063/1.1807958 85, 3498 (2004).
16. C.-H. Lai, Y.-C. Wu, and C.-C. Chiang, J. Appl. Phys.. 97, 10H305 (2005).
17. S. Fähler, U. Hannemann, M. Weisheit, V. Neu, S. Melcher, S. Leinert, S. C. Wimbush, A. Singh, A. Kwon, B. Holzapfel, and L. Schultz, Appl. Phys. A 79, 1529 (2004).
18. M. Weisheit, L. Schultz, and S. Fähler, J. Magn. Magn. Mater. 290-291, 570 (2005).
19. K. Sturm and H.-U. Krebs, J. Appl. Phys. 0021-8979 10.1063/1.1379050 90, 1061 (2001).
20. T. Klemmer, D. Hoydick, H. Okumura, B. Zhang, and W. A. Soffa, Scr. Metall. Mater. 0956-716X 10.1016/0956-716X(95)00413-P 33, 1793 (1995).
21. S. Okamoto, N. Kikuchi, O. Kitakami, T. Miyazaki, Y. Shimada, and K. Fukamichi, Phys. Rev. B 0163-1829 10.1103/PhysRevB.66.024413 66, 024413 (2002).
22. T. Shima, K. Takanashi, Y. K. Takahashi, and K. Hono, Appl. Phys. Lett. 0003-6951 10.1063/1.1794863 85, 2571 (2004).
23. Y. Ide, T. Goto, K. Kikuchi, K. Watanabe, J. Onagawa, and H. Y. J. M. Cadogan, J. Magn. Magn. Mater. 177-181, 1245 (1998).
24. A. M. Ferrari and G. Pacchioni, J. Phys. Chem. 0022-3654 10.1021/jp953633m 100, 9032 (1996).
25. A. V. Matveev, K. M. Neyman, I. V. Yudanov, and N. Rösch, Surf. Sci. 0039-6028 10.1016/S0039-6028(99)00327-1 426, 123 (1999).
26. S. Fähler and H. U. Krebs, Appl. Surf. Sci. 96-98, 61 (1996).
27. K. Sturm, S. Fähler, and H. -U. Krebs, Appl. Surf. Sci. 154-155, 462 (2000).
28. G. Haas, A. Menck, H. Brune, J. V. Barth, J. A. Venables, and K. Kern, Phys. Rev. B 0163-1829 10.1103/PhysRevB.61.11105 61, 11105 (2000).