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Volumn 52, Issue 4, 2006, Pages 336-341

Imaging properties of phase-shifting apodizers

Author keywords

Image formation; Optical transfer function; Phase shifting apodizer

Indexed keywords


EID: 33749675657     PISSN: 0035001X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (15)
  • 2
    • 0026638465 scopus 로고
    • Optimization of real phase mask performance
    • Annual BACUS Symposium on Photomask Technology
    • F. Schellenberg, M.D. Levenson, and P.J. Brook. "Optimization of real phase mask performance", Proc. of SPIE 1604, Annual BACUS Symposium on Photomask Technology, (1991).
    • (1991) Proc. of SPIE , vol.1604
    • Schellenberg, F.1    Levenson, M.D.2    Brook, P.J.3
  • 3
    • 0026368777 scopus 로고
    • Fabrication of Phase Shifting mask
    • Optical/lase Microlithography IV
    • Naoyuki Ishiwata and Takao Furukawa, "Fabrication of Phase Shifting mask", Proc. of SPIE 1463, Optical/lase Microlithography IV, (1991).
    • (1991) Proc. of SPIE , vol.1463
    • Ishiwata, N.1    Furukawa, T.2
  • 4
    • 0026368787 scopus 로고
    • Phase Shifting Photolithography Applicable to Real IC Patterns
    • Optical/lase Microlithography IV
    • Yuichiro Yanagishita, Naoyuki Ishiwata, Yasuko Tabata, Kenji Nakagawa, and Kasumasa Shigematsu. "Phase Shifting Photolithography Applicable to Real IC Patterns". Proc of SPIE 1463, Optical/lase Microlithography IV, (1991).
    • (1991) Proc of SPIE , vol.1463
    • Yanagishita, Y.1    Ishiwata, N.2    Tabata, Y.3    Nakagawa, K.4    Shigematsu, K.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.