Model-based infrared metrology for advanced technology nodes and 300 mm wafer processing

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 620-624

  Rosenthal, Peter A ^a   Duran, Carlos ^a   Tower, Josh ^a   Mazurenko, Alex ^a   Mantz, Ulrich ^b   Weidner, Peter ^b   Kasic, Alexander ^b  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

DRAM manufacturing; Infrared; Model based; Reflectometry

Indexed keywords

EID: 33749671530     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2063029     Document Type: Conference Paper

References (1)

1. Bohren, C.F. and Huffman, D.R., Absorption and Scattering of Light by Small Particles, John Wiley and Sons, New York, 1983.