Fabrication tolerance of asymmetric silicon-on-insulator polarization rotators

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 23, Issue 7, 2006, Pages 1741-1745

  Deng, Henghua ^a   Yevick, David O ^a   Brooks, Chris ^b   Jessop, Paul E ^b  

^a UNIVERSITY OF WATERLOO   (Canada)

^b MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LIGHT POLARIZATION; OPTICAL WAVEGUIDES; SILICON ON INSULATOR TECHNOLOGY;

ASYMMETRIC EXTERNAL WAVEGUIDING REGIONS; FABRICATION TOLERANCE; POLARIZATION ROTATOR; RIB WAVEGUIDES; SILICON-ON-INSULATOR POLARIZATION ROTATORS;

OPTICAL ROTATION;

EID: 33749643185     PISSN: 10847529     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAA.23.001741     Document Type: Article

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