Properties of the Ni-Cr oxide films prepared by magnetron sputtering

Shinku/Journal of the Vacuum Society of Japan

Volumn 49, Issue 7, 2006, Pages 443-445

  Saito, Nobuo ^a   Nakaaki, Isamu ^b   Iwata, Hiromu ^c,d   Sugiyama, Osamu ^b  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b Fuji Industrial Research Institute of Shizuoka Prefecture   (Japan)

^c Kagawa Prefectural Industrial Research Institute   (Japan)

^d NATIONAL INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED SENSORS; OPTICAL BANDGAP; PARTIAL PRESSURE RATIO; THERMISTOR COEFFICIENT;

CHROMIUM COMPOUNDS; ELECTRIC PROPERTIES; INFRARED DETECTORS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PARTIAL PRESSURE; THIN FILMS; X RAY DIFFRACTION;

NICKEL COMPOUNDS;

EID: 33749543458     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.49.443     Document Type: Article

References (11)