Fabrication of highly ordered nanoporous alumina films by stable high-field anodization

Nanotechnology

Volumn 17, Issue 20, 2006, Pages 5101-5105

  Li, Yanbo ^a   Zheng, Maojun ^a   Ma, Li ^a   Shen, Wenzhong ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ALUMINA FILMS; ANODIZING CURRENT DENSITY; SELF-ORDERED ALUMINA FILMS;

ALUMINUM COMPOUNDS; COST EFFECTIVENESS; CURRENT DENSITY; FILM GROWTH; POROUS MATERIALS; THIN FILMS;

NANOSTRUCTURED MATERIALS;

EID: 33749526886     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/20/010     Document Type: Conference Paper

References (16)

1. Liu C H, Yiu W C, Au F C K, Ding J X, Lee C S and Lee ST 2003 Appl. Phys. Lett. 83 3168
2. Nielsch K, Müller F, Li A P and Gösele U 2000 Adv. Mater. 12 582
3. Nishio K and Masuda H 2004 Electrochem. Solid-State Lett. 7 H27
4. Masuda H and Fukuda K 1995 Science 268 1466
5. Masuda H, Hasegawa F and Ono S 1997 J. Electrochem. Soc. 144 L127
6. Masuda H, Yada K and Osaka A 1998 Japan. J. Appl. Phys. 2 37 L1340
7. Masuda H, Ohya M, Asoh H, Nakao M, Nohtomi M and Tamamura T 1999 Japan. J. Appl. Phys. 38 L1403
8. Choi J, Luo Y, Wehrspohn R B, Hillebrand R, Schilling J and Gösele U 2003 J. Appl. Phys. 94 4757
9. Mirkulskas I, Juodkazis S, Tomasiunas R and Dumas J G 2001 Adv. Mater. 13 1574
10. Fournier-Bidoz S, Kitaev V, Routkevitch D, Manners I and Ozin G A 2004 Adv. Mater. 16 2193
11. Sun Z J and Kim H K 2002 Appl. Phys. Lett. 81 3458
12. Ono S, Saito M and Asoh H 2004 Electrochem. Solid-State Lett. 7 B21
13. Chu S Z, Wada K, Inoue S, Isogai M and Yasumori A 2005 Adv. Mater. 17 2115
14. Keller F, Hunter M S and Robinson D L 1953 J. Electrochem. Soc. 100 411
15. Thompson G E 1997 Thin Solid Films 297 192
16. Jessensky O, Müller F and Gösele U 1998 Appl. Phys. Lett. 72 1173