Process of pulse electrodeposition of nanocrystalline Ni-Cr alloy from trivalent chromium bath

Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals

Volumn 16, Issue 7, 2006, Pages 1281-1287

  He, Xin Kuai ^a,b   Chen, Bai Zhen ^a,b   Wu, Lu Ye ^a   Li, Xiao Dong ^a   He, Quan Guo ^a  

^a HUNAN UNIVERSITY OF TECHNOLOGY   (China)

^b CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Nanocrystalline; Ni Cr alloy; Pulse electrodeposition; Trivalent chromium

Indexed keywords

CHEMICAL COMPOSITION; CHROMIUM DEPOSITS; NANOCRYSTALLINE; NICKEL CHROMIUM ALLOY; PH VALUE; PULSE ELECTRODEPOSITION; TRIVALENT CHROMIUM;

CHROMITE DEPOSITS; COMPOSITION; CRYSTALLINE MATERIALS; CURRENT DENSITY; ELECTRODEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NICKEL ALLOYS; PLATING; SCANNING ELECTRON MICROSCOPY; STABILIZERS (AGENTS); X RAY DIFFRACTION ANALYSIS;

CHROMIUM ALLOYS;

EID: 33749516618     PISSN: 10040609     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. Kim M, Park S U, Kim D Y, et al. Characterization of chromium-carbon layer fabricated by electrodeposition in trivalent chromium bath[J]. Materials Science Forum, 2005, 475-479(5): 3823-6.
2. El-Sharif M, McDougall J, Chisholm C U. Electrodeposition of thick chromium coatings from an environmentally acceptable chromium(III)-glycine complex[J]. Transactions of the Institute of Metal Finishing, 1999, 77(4): 139-144.
3. Ibrahim S K, Gawne D T, Watson A. Corrosion and wear resistance of thick chromium deposits from accelerated Cr(III) electrolytes[J]. Transactions of the Institute of Metal Finishing, 1998, 76(4): 156-161.
4. Abd E R S S, Ibrahim M A M, Dankeria M M. Thin films of chromium electrodeposition from a trivalent chromium electrolyte[J]. Transactions of the Institute of Metal Finishing, 2002, 80(1): 29-33.
5. ZHANG Pi-jian, ZOU Li-zhuang, WANG Xiao-lin. Ni-Cr alloy electrodeposition[J]. Materials Protection, 1997, 30(3): 16-18.
6. Wang F, Watanabe T. Preparation and characterization of the electrodeposited Fe-Cr alloy film[J]. Materials Science and Engineering A, 2003, 349(1-2): 183-190.
7. FENG Shao-bin, FENG Li-ting, SHANG Shi-bo. Chromium-nickel alloy electroplating technology for trivalent chromium system[J]. Materials Protection, 2004, 37(5): 24-25.
8. Nam K S, Lee K H, Kwon S C, et al. Improved wear and corrosion resistance of chromium(III) plating by oxynitrocarburising and steam oxidation[J]. Materials Letters, 2004, 58(27-28): 3540-3544.
9. Renz R P, Fortman J J, Taylor E J, et al. Electrodeposition of hard, functional chromium from a trivalent bath, to replace hexavalent chromium plating[A]. International Surface Engineering Congress-Proceedings of the 1st Congress[C]. Colombus, OH, United States: ASM International, 2003. 174-180.
10. HE Xiang-zhu, ZENG Zhen-ou, PENG Rong-hua, et al. Research on the electrodeposition of amorphous Fe-Ni-Cr alloy in trivalence chromium aqueous[J]. Journal of South China University of Technology (Natural Science), 2003, 31(3): 15-20.
11. Boiadjieva T, Money M, Raichevski G S. Electrodeposition of zinc-chromium alloys[J]. UPB Scientific Bulletin, Series B: Chemistry and Materials Science, 2001, 63(3): 135-140.
12. Chang Y C, Yeh J C, Lin C I. Process characterization of nickel-chromium alloy electrodeposition by statistical analysis[J]. Journal of the Chinese Institute of Chemical Engineers, 2001, 32(4): 351-359.
13. DENG Shu-hao, GONG Zhu-qing. Electrochemical mechanism of trivalent chromium electrodeposition[J]. Journal of Central South University (Science and Technology), 2005, 36(2): 213-218.
14. ZHANG Pi-jian, ZOU Li-zhuang, WANG Xiao-lin. Influencing factors on Cr content in Ni-Cr deposit[J]. Materials Protection, 2004, 30(9): 22-23.
15. Kwon S C, Kim M, Park S U, et al. Characterization of intermediate Cr-C layer fabricated by electrodeposition in hexavalent and trivalent chromium baths[J]. Surface and Coatings Technology, 2004, 183(2-3): 151-6.
16. Song Y B, Chin D T. Current efficiency and polarization behavior of trivalent chromium electrodeposition process[J]. Electrochimica Acta, 2002, 48(4): 349-356.
17. GONG Zhu-qing, DENG Shu-hao, CHEN Wen-mi. Pulse electrodeposition of nanocrystalline nickel-ironchromium alloy(I)-Techniques of electrodeposition[J]. The Chinese Journal of Nonferrous Metals, 2003, 13(2): 511-516.