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Volumn 89, Issue 14, 2006, Pages

Change in phase separation and electronic structure of nitrided Hf-silicate films as a function of composition and post-nitridation anneal

Author keywords

[No Author keywords available]

Indexed keywords

HFSIO; MOLE FRACTIONS; SIO2; SUPPRESSIONS;

AMMONIUM COMPOUNDS; ANNEALING; DIFFUSION; ELECTRONIC STRUCTURE; PHASE SEPARATION; THERMODYNAMIC STABILITY;

SILICATES;

EID: 33749490436 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2355478 Document Type: Article

Times cited : (7)

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