Impact of interface micro-roughness on low frequency noise in (110) and (100) pMOSFETs

AIP Conference Proceedings

Volumn 780, Issue , 2005, Pages 199-202

  Gaubert, P ^a   Teramoto, A ^a   Hamada, T ^a   Yamamoto, M ^a   Nii, K ^a   Akahori, H ^a   Kotani, K ^a   Ohmi, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

1 f noise; MOSFET; Silicon; Surface micro roughness; Surface orientation

Indexed keywords

EID: 33749478399     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2036731     Document Type: Conference Paper

References (6)

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6. Akahori, H., Nii, K., Teramoto, A., Sugawa, S., and Ohmi, T., Extend Abstracts of the 2003 Int. Conf. SSDM, 2003, pp. 458-459.