Superconductivity in heavily boron-doped diamond films prepared by electron assisted chemical vapour deposition method

Chinese Physics Letters

Volumn 23, Issue 10, 2006, Pages 2856-2858

  Li, Chun Yan ^a   Li, Bo ^a   Lü, Xian Yi ^a   Li, Ming Ji ^a   Wang, Zong Li ^b   Gu, Chang Zhi ^b   Jin, Zeng Sun ^a  

^a JILIN UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ELECTRIC RESISTANCE; FILM PREPARATION; SCANNING ELECTRON MICROSCOPY; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; X RAY DIFFRACTION;

3-CARRIERS; BORON-DOPED; BORON-DOPED DIAMOND FILMS; CHEMICAL VAPOR DEPOSITION METHODS; CRYSTALLINE FACETS; ELECTRON ASSISTED CHEMICAL VAPOR DEPOSITION; FILM RESISTIVITY; ONSET TEMPERATURE; THICK DIAMOND FILMS; ZERO RESISTANCE;

CARRIER CONCENTRATION;

EID: 33749415355     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/10/063     Document Type: Article

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