Development of microplasma source for trace elemental analysis and its application to AES measurement of halogen

Bunseki Kagaku

Volumn 55, Issue 8, 2006, Pages 555-560

  Ohba, Goro ^a   Miyahara, Hidekazu ^a   Watanabe, Masato ^a   Hotta, Eiki ^a   Okino, Akitoshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Halogen; Microplasma; Plasma source

Indexed keywords

EID: 33749381224     PISSN: 05251931     EISSN: 05251931     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.55.555     Document Type: Article

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