High quality microstrip termination for MMIC and millimeter-wave applications

IEEE MTT-S International Microwave Symposium Digest

Volumn 2005, Issue , 2005, Pages 1827-1830

  Monje, Raquel R ^a   Vassilev, Vessen ^a   Pavolotsky, Alexey ^a   Belitsky, Victor ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Microstrip; RF surface current distribution; Termination; Thin film resistance

Indexed keywords

ELECTRIC LINES; ELECTRIC RESISTANCE; MATHEMATICAL MODELS; MICROSTRIP LINES; MILLIMETER WAVES; THIN FILMS;

MICROSTRIPS; RF SURFACE CURRENT DISTRIBUTION; TERMINATION; THIN-FILM RESISTANCE;

MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;

EID: 33749234027     PISSN: 0149645X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MWSYM.2005.1517082     Document Type: Conference Paper

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