Aligning capabilities of a nematic liquid crystal on treated SiO x thin-film layers by electron beam evaporation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 9 A, 2006, Pages 7050-7052

  Kang, Hyung Ku ^a   Han, Jin Woo ^a   Kang, Soo Hee ^a   Kim, Jong Hwan ^a   Kim, Young Hwan ^a   Hwang, Jeoung Yeon ^a   Seo, Dae Shik ^a  

^a Yonsei University   (South Korea)

Author keywords

Annealing; LC alignment; Pretilt angle; SiOx thin film; Thermal stability

Indexed keywords

ANNEALING; ELECTRON BEAMS; EVAPORATION; SILICA; THERMODYNAMIC STABILITY; THIN FILMS;

LC ALIGNMENT; PRETILT ANGLE; SIOX THIN FILMS;

NEMATIC LIQUID CRYSTALS;

EID: 33749020803     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7050     Document Type: Article

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