Laser oscillation of Nd-doped silica glass with high thermal shock parameter

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 9 A, 2006, Pages 6936-6939

  Sato, Takahiro ^a   Fujimoto, Yasushi ^a   Ueda, Tetsuji ^b   Fujinoki, Akira ^b   Okada, Hajime ^a   Yoshida, Hidetsugu ^a   Sumimura, Kazuhiko ^a   Nakatsuka, Masahiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

High thermal shock parameter; High average power laser; Laser medium; Laser oscillation; Silica glass

Indexed keywords

DOPING (ADDITIVES); LASER APPLICATIONS; MIRRORS; OSCILLATIONS; PARAMETER ESTIMATION;

HIGH THERMAL SHOCK PARAMETER; HIGH-AVERAGE-POWER LASER; LASER MEDIUM; LASER OSCILLATION; THERMAL SHOCK;

FUSED SILICA;

EID: 33748990570     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.6936     Document Type: Article

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