Simulation of temperature and gas flow distributions in region close to a diamond substrate with finite thickness

Diamond and Related Materials

Volumn 15, Issue 10, 2006, Pages 1738-1742

  Yamada, Hideaki ^a   Chayahara, Akiyoshi ^a   Mokuno, Yoshiaki ^a   Horino, Yuji ^a   Shikata, Shinichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

CVD; Microwave; Simulation and modeling; Single crystal diamond

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DIAMONDS; MICROWAVES; MORPHOLOGY; SUBSTRATES;

FINITE THICKNESS; MACROSCOPIC SURFACE MORPHOLOGIES; SIMULATED DISTRIBUTIONS; THICK SINGLE CRYSTAL;

TEMPERATURE DISTRIBUTION;

EID: 33748934021     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.03.001     Document Type: Article

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