Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle of incidence

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 439-443

  Savaloni, H ^a,b   Reissi, M H ^a   Shariati, M ^a   Player, M A ^c  

^a UNIVERSITY OF TEHRAN   (Iran)

^b ISLAMIC AZAD UNIVERSITY   (Iran)

^c UNIVERSITY OF ABERDEEN   (United Kingdom)

Author keywords

AFM; Angle of incidence; Deposition rate; Preferred orientation; XRD

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; DEPOSITION; NANOSTRUCTURED MATERIALS; TITANIUM; X RAY DIFFRACTION;

AFM IMAGES; ANGLE OF INCIDENCE; DEPOSITION RATE; PREFERRED ORIENTATION;

THIN FILMS;

EID: 33748912154     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.283     Document Type: Article

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