SCOPUS 정보 검색 플랫폼

Volumn 100, Issue 1, 2006, Pages 31-33

Micro-structural and dielectric properties of porous TiO2 films synthesized on titanium alloys by micro-arc discharge oxidization

(5) Jin, Fanya a,b Tong, Honghui b Shen, Liru b Wang, Ke b Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b SOUTHWESTERN INSTITUTE OF PHYSICS (China)

Author keywords

Dielectric constant; Micro arc discharge oxidization; Porous TiO2 films

Indexed keywords

CURRENT DENSITY; DIELECTRIC LOSSES; DIELECTRIC PROPERTIES; MICROELECTRONICS; MICROSTRUCTURE; OXIDATION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

MICRO-ARC DISCHARGE OXIDIZATION; POROUS TIO2 FILMS; TANGENTIAL LOSSES; VECTOR ANALYSIS;

THIN FILMS;

EID: 33748753841 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2005.12.001 Document Type: Article

Times cited : (36)

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