Structural and magnetic characterization of Ni-filled porous silicon

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 716-720

  Rumpf, K ^a   Granitzer, P ^a   Polt P ^b   Reichmann, A ^b   Krenn, H ^a  

^a UNIVERSITY OF GRAZ   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Electrodeposition; Nanomagnetism; Nanowires; Porous silicon

Indexed keywords

ANODIC OXIDATION; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTRODEPOSITION; ETCHING; MAGNETIZATION; NANOSTRUCTURED MATERIALS; NICKEL COMPOUNDS;

HIGH FIELD SWITCHING; MESOPOROUS RANGE; NANOMAGNETISM; NANOWIRES;

POROUS SILICON;

EID: 33748746582     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.182     Document Type: Article

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