Structural and magnetoresistive properties of Co/Cu multilayers

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART II, 2001, Pages 1735-1737

  Marszalek M ^a   Jaworski, J ^a   Michalik, A ^a   Prokop, J ^a   Stachura, Z ^a   Voznyi, V ^b   Boiling O ^c   Sulkio Cleff, B ^c  

^a INSTITUTE OF NUCLEAR PHYSICS   (Poland)

^b INSTITUTE OF APPLIED PHYSICS   (Ukraine)

^c UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Atomic force microscopy; Grain size; Magnetoresistance multilayers; Structural ordering; X ray diffraction; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; DEPOSITION RATES; GIANT MAGNETORESISTANCE; LEAD; MAGNETIC FILMS; MAGNETORESISTANCE; MULTILAYERS; REFLECTION; X RAY DIFFRACTION;

FERROMAGNETIC COUPLING; GRAIN SIZE; INTERFACIAL ROUGHNESS; MAGNETORESISTANCE MEASUREMENTS; MAGNETORESISTANCE-MULTILAYERS; MAGNETORESISTIVE PROPERTY; STRUCTURAL ORDERING; X RAY REFLECTIVITY;

CRYSTAL ATOMIC STRUCTURE;

EID: 33748687754     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)00876-3     Document Type: Article

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