Magnetic properties of as-sputtered Co-Ni-Fe alloy films

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART II, 2001, Pages 1507-1509

  Kim, Y M ^a   Choi, D ^a   Kim, S R ^b   Kim, K H ^c   Kim, J ^c   Han, S H ^b   Kim, H J ^b  

^a Myong Ji University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

High saturation magnetization; RF sputtering; Soft magnetic films; Thin films

Indexed keywords

COBALT ALLOYS; COMPOSITE FILMS; MAGNETIC PROPERTIES; MAGNETISM; MAGNETIZATION; MAGNETRON SPUTTERING; NICKEL; SATURATION MAGNETIZATION; THIN FILMS;

COMPOSITION RANGES; EFFECTIVE PERMEABILITY; ELECTROPLATED FILMS; HIGH FREQUENCY CHARACTERISTICS; HIGH-SATURATION MAGNETIZATION; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; SOFT MAGNETIC FILMS;

COBALT;

EID: 33748684375     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00024-5     Document Type: Article

References (2)

1. H.Y. Wang, Y.J. He, Z.W. Ma, E.Y. Jiang, J. Appl. Phys. 85 (1999) 3745.
2. Tetsuya. Osaka, Madoka Takai, Katsuyoshi Hayashi, Yoshimichi Sogawa, IEEE Trans. Magn. 34 (1998) 1432.