High refractive index fluid for next generation ArF immersion lithography

Journal of Photopolymer Science and Technology

Volumn 19, Issue 5, 2006, Pages 641-646

  Furukawa, Taiichi ^a   Hieda, Katsuhiko ^a   Wang, Yong ^a   Miyamatsu, Takashi ^a   Yamada, Kinji ^a   Tominaga, Tetsuo ^a   Makita, Yutaka ^a   Nakagawa, Hiroki ^a   Nakamura, Atsushi ^a   Shima, Motoyuki ^a   Shimokawa, Tsutomu ^a  

^a JSR CORPORATION   (Japan)

Author keywords

ArF immersion lithography; High refractive index fluid; Photo decomposition; Photoresist defects; UV absorption

Indexed keywords

EID: 33748580224     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.641     Document Type: Article

References (5)

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4. Y.Wang, T.Miyamatsu, T.Furukawa, K.Yamada, T.Tominaga, Y.Makita, H.Nakagawa, A.Nakamura, M.Shima, S.Kusumoto, T.Shimokawa, K.Hieda, Proc SPIE, (2006) in press
5. nd International Symposium on Immersion Lithography (2005)