Shave-off depth profiling for nano-devices

Microchimica Acta

Volumn 155, Issue 1-2, 2006, Pages 219-223

  Nojima, Masashi ^a,b   Toi, Masayuki ^a,b   Maekawa, Ayaka ^a,b   Yamamoto, Takeshi ^a,b   Sakamoto, Tetsuo ^c   Owari, Masanori ^b   Nihei, Yoshimasa ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Depth profiling; FIB; Nano device; SIMS

Indexed keywords

EID: 33748545650     PISSN: 00263672     EISSN: 14365073     Source Type: Journal    
DOI: 10.1007/s00604-006-0546-5     Document Type: Conference Paper

References (4)

1. Nojima M, Toi M, Maekawa A, Tomiyasu B, Sakamoto T, Owari M, Nihei M (2004) Appl Surf Sci 231-232: 930
2. Nojima M, Toi M, Maekawa A, Tomiyasu B, Sakamoto T, Owari M, Nihei Y (2004) J Surf Sci Nanotech 2: 131
3. Satoh H, Owari M, Nihei Y (1988) J Vac Sci Technol B6: 915
4. Toi M, Maekawa A, Yamamoto T, Tomiyasu B, Sakamoto T, Owari M, Nojima M, Nihei Y (2005) J Surf Anal 12: 170