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Volumn 201, Issue 3-4, 2006, Pages 1845-1851

Monte-Carlo simulation of ionisation in self-induced ion plating (SIIP)

Author keywords

Ion plating; Ionisation; Magnetron; Monte Carlo; Sputtering; Vacuum evaporation

Indexed keywords

COMPUTER SIMULATION; HEAT FLUX; ION BOMBARDMENT; IONIZATION; MAGNETRON SPUTTERING; MONTE CARLO METHODS;

EID: 33748528959     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.03.009     Document Type: Article
Times cited : (2)

References (8)
  • 2
    • 33748575021 scopus 로고    scopus 로고
    • Plasma Surface Engineering Corporation, Technology Note: Magnetron sputtering, Feb. 2003. Available from Internet: .
  • 4
    • 33748567560 scopus 로고    scopus 로고
    • P. Vanden Brande, S. Lucas, A. Weymeersch, European Patent N° 0780489 (Nov. 1996).
  • 5
    • 33748561250 scopus 로고    scopus 로고
    • Femlab 3.1 Documentaion, Comsol Inc., 2004.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.