Positive and negative lithography by photochemical metalorganic deposition from metal 2-ethylhexanoates

Journal of Photopolymer Science and Technology

Volumn 19, Issue 4, 2006, Pages 467-475

  Trudel, Simon ^a   Li, Guizhi ^a   Zhang, Xin ^a   Hill, Ross H ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Metal oxides; Photochemical metalorganic deposition; Positive and negative photolithography

Indexed keywords

EID: 33748471704     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.467     Document Type: Article

References (14)

1. M. J. Madou, "Fundamentals of Microfabriaction, 2nd Edition", CRC Press, Boca Raton, 2002.
2. J. P. Bravo-Vasquez, L. W. Celia Ching, W. L. Law and R. H. Hill, J. Photopolym. Sci. Technol., 11 (1998), 589.
3. R. H. Hill and S. L. Blair, ACS Symp. Ser., 706 (1998), 53.
4. W. L. Law and R. H. Hill, Mater. Res. Bull., 33 (1998), 69
5. L. S. Andronic and R. H. Hill, J. Photochem. Photobiol., A, 152 (2002), 259.
6. H. J. Zhu and R. H. Hill, J. Non-Cryst. Solids, 311 (2002), 174.
7. R. H. Hill, S. L. Blair, G. Li, X. Zhang and H. Ruan, U.S. patent application No. 20,040,126,711 (2004)
8. See paper by X. Zhang and R. H. Hill, this issue.
9. K. Nakamoto, "Infrared and Raman Spectra of Inorganic and Coordination Compounds, 5th Edition", John Wiley & Sons, New York, 1997.
10. R. A. Sheldon and J. K. Kochi, J. Am. Chem. Soc., 90 (1968), 6688.
11. E. K. Fields and S. Meyerson, J. Org. Chem., 41 (1976), 916.
12. S. L. Blair, J. Hutchins, R. H. Hill and D. G. Bickley, J. Mater. Sci., 29 (1994), 2143.
13. A. A. Avey and R. H. Hill, J. Am. Chem. Soc., 118 (1996), 237.
14. J. P. Bravo-Vasquez and R. H. Hill, Polyhedron, 19 (2000), 343.