MgB 2 thick film with T C = 40.2 K deposited on sapphire substrate

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 10, 2006, Pages 2463-2467

  Zhang, Kaicheng ^a   Ding, Li Li ^a   Zhuang, Cheng Gang ^a   Chen, Li Ping ^a   Chen, Chinping ^a   Feng, Qing Rong ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HYBRID PHYSICAL-CHEMICAL VAPOR DEPOSITION (HPCVD); RESIDUAL RESISTIVITY RATIO (RRR); SUPERCONDUCTING APPLICATIONS; TRANSPORT MEASUREMENTS;

CHEMICAL VAPOR DEPOSITION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTALLINE MATERIALS; MAGNESIUM COMPOUNDS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SUPERCONDUCTIVITY;

THICK FILMS;

EID: 33748428744     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200522262     Document Type: Article

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