Sensitization by formate ions doped at different depths in silver bromide microcrystals

Journal of Imaging Science and Technology

Volumn 50, Issue 4, 2006, Pages 394-399

  Ma, Wangjing ^b   Guo, Hong ^b   Xia, Peijie ^a  

^a TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CRYSTAL MICROSTRUCTURE; DOPING (ADDITIVES); EMULSIONS; HOLE TRAPS; MICROCOMPUTERS; PRECIPITATION (CHEMICAL); SILVER COMPOUNDS;

FOG DENSITY; FORMATE IONS; MICROCRYSTALS; SENSITIZATION;

CRYSTALS;

EID: 33748316473     PISSN: 10623701     EISSN: None     Source Type: Journal    
DOI: 10.2352/J.ImagingSci.Technol.(2006)50:4(394)     Document Type: Article

References (11)

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