Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8151-8155

  Paul, Amitesh ^a   Wingbermühle, Jorg ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Surface structure and topography

Indexed keywords

FILM GROWTH; FREE ENERGY; ION BEAMS; KINETIC ENERGY; MORPHOLOGY; NUCLEATION; SPUTTER DEPOSITION; SURFACES; THIN FILMS;

CHEMICAL FREE ENERGY; ION BEAM SPUTTERING; NUCLEATION THEORY; SUBSTRATE TEMPERATURE;

ALUMINUM;

EID: 33748168719     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.10.056     Document Type: Article

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