Surface analytical studies of Ar-plasma etching of thin heptadecafluoro-1-decene plasma polymer films

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8331-8336

  Wang, Xuemei ^a   Grundmeier, Guido ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Morphology; Plasma etching; Plasma polymer; Surface; Teflon like films

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; PLASTIC FILMS; POLYMERIZATION; POLYTETRAFLUOROETHYLENES; STRUCTURE (COMPOSITION); SURFACE CHEMISTRY; SURFACE TOPOGRAPHY; SURFACES; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT ANGLE MEASUREMENTS; HEPTADECAFLUORO-1-DECENE (HDFD); PLASMA POLYMERS; TEFLON-LIKE FILMS;

PLASMA ETCHING;

EID: 33748149920     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.11.045     Document Type: Article

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