Quantitative analysis of thermally induced desorption during halogen-etching of a silicon (1 1 1) surface

Surface Science

Volumn 600, Issue 16, 2006, Pages 3147-3153

  Shudo, K ^a,b   Kirimura, T ^a,b   Tanaka, Y ^b   Ishikawa, T ^b   Tanaka, M ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b RIKEN   (Japan)

Author keywords

Etching energy; Silicon; Spectroscopy; Thermal desorption

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; CHLORINE; DESORPTION; ETCHING; HALOGENATION; SPECTROSCOPIC ANALYSIS; SURFACE REACTIONS; THERMOANALYSIS;

ETCHING ENERGY; ISOTHERMAL PROCESS; SECOND-ORDER REACTION; THERMAL DESORPTION;

SILICON;

EID: 33748085366     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.05.052     Document Type: Article

References (30)

1. For example, a fragmentation reaction was found on an organic/inorganic surface with TDS:. Zahidi El.M., O-Hassani H., and McBreen P.H. Nature 409 (2001) 1023
2. Shirao T., Shudo K., Tanaka Y., Nakajima T., Ishikawa T., and Tanaka M. Jpn. J. Appl. Phys. 42 (2003) 593
3. Takayanagi K., Tanishiro Y., Takahashi M., and Takahashi S. J. Vac. Sci. Technol. A 3 (1985) 1502
4. Itchkawitz B.S., McEllistrem M., Grube H., and Boland J.J. Surf. Sci. 385 (1997) 281
5. Itchkawitz B.S., McEllistrem M.T., Grube H., and Boland J.J. Phys. Rev. Lett. 78 (1997) 98
6. Pechman R.J., Wang X.-S., and Weaver J.H. Phys. Rev. B 52 (1995) 11412
7. Shudo K., Washio H., and Tanaka M. J. Chem. Phys. 119 (2003) 13077
8. Whitman L.J., Joyce S.A., and Yarmoff J.A. Surf. Sci. 232 (1990) 297
9. Gupta P., Coon P.A., Koehler B.G., and George S.M. Surf. Sci. 249 (1991) 92
10. Matsuo J., Yannick F., and Karahashi K. Surf. Sci. 283 (1993) 52
11. Ichikawa T., and Ino S. Surf. Sci. 105 (1981) 395
12. Schnell R.D., Rieger D., Bogen A., Himpsel F.J., Wandelt K., and Steinmann W. Phys. Rev. B 32 (1985) 8057
13. Boland J.J., and Villarrubia J.S. Phys. Rev. B 41 (1990) 9865
14. Boland J.J., and Villarrubia J.S. Science 248 (1990) 838
15. Grude H., and Boland J.J. Surf. Sci. 407 (1998) 152
16. Kirimura T., Shirao T., Shudo K., Tanaka Y., Ishikawa T., and Tanaka M. Surf. Sci. 566/568P2 (2004) 1137
17. Shudo K., Kirimura T., Kaneko N., Takahashi M., Tanaka Y., Ishikawa T., and Tanaka M. Surf. Sci. 566/568P1 (2004) 425
18. Pétermann L.A. Prog. Surf. Sci. 3 (1972) 1
19. Sakurai S., and Nakayama T. Jpn. J. Appl. Phys. 41 (2002) 2171
20. Smith P.V., and Cao P.-L. J. Phys.: Condens. Matter 7 (1995) 7125
21. Kirimura T., Shudo K., Hayashi Y., Tanaka Y., Ishikawa T., and Tanaka M. Phys. Rev. B 73 (2006) 085309-1
22. Readhead P.A. Vacuum 12 (1962) 203
23. Parker D.H., Jones M.E., and Koel B.E. Surf. Sci. 233 (1990) 65
24. Zhdanov V.P. Surf. Sci. Rep. 12 (1991) 185
25. Tanaka M., Shirao T., Sasaki T., Shudo K., Washio H., and Kaneko N. J. Vac. Sci. Technol. A20 (2002) 1358
26. Cao P.-L., and Smith P.V. J. Phys.: Condens. Matter 7 (1995) 7113
27. Cao P.-L., and Smith P.V. J. Phys.: Condens. Matter 7 (1995) 7125
28. Seel M., and Bagus P.S. Phys. Rev. B 28 (1983) 2023 and references therein
29. Aizawa H., Tsuneyuki S., and Ogitsu T. Surf. Sci. 438 (1999) 18
30. Sakurai S., and Nakayama T. J. Cryst. Growth 237/239 (2002) 212