FPGA based high-speed system solutions for innovative maskless lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Voss, Sven Hendrik ^a   Talmi, Maati ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

FPGA implementation; High speed buffer; Maskless lithography; Optimized architecture; PCB

Indexed keywords

DATA TRANSFER; ELECTRONICS PACKAGING; MASKS; PHOTOLITHOGRAPHY; PRINTED CIRCUIT BOARDS;

FPGA IMPLEMENTATION; HIGH-SPEED BUFFERS; MASKLESS LITHOGRAPHY; OPTIMIZED ARCHITECTURE;

FIELD PROGRAMMABLE GATE ARRAYS;

EID: 33748072448     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681794     Document Type: Conference Paper

References (5)

1. Hans Loeschner, E-beam Maskless Nanolithography and Ion Beam Nanofabrication, Invited talk, EIPBN'2004, San Diego, California, USA, 2004
2. Xilinx Inc, Virtex-II Pro and Virtex-11 Pro X Platform FPGAs: Complete Data Sheet, DS083 (v4.0), 2004
3. Micron Technology Inc, Memory modules overview, http://www.micron.com/ products/modules/ddrsdram, 2006
4. Xilinx Inc, Press Release # 0575
5. Sven-Hendrik Voss, Maati Talmi, Lossless high-speed data compression for optical interconnects as used in maskless lithography systems, Proceedings of the MNE 2005 International Conference, Microelectronic Engineering, Elsevier 2005