Thin films deposition with ECR planar plasma source

Vacuum

Volumn 80, Issue 11-12, 2006, Pages 1272-1277

  Tereshin, Vladimir ^a   Bovda, Aleksandr ^a   Bovda, Vera ^a   Byrka, Oleg ^a   Chebotarev, Vladimir ^a   Fedorchenko, Vladimir ^a   Garkusha, Igor̀ ^a  

^a INSTITUTE OF PLASMA PHYSICS   (Ukraine)

Author keywords

Amorphous films; Coating deposition; ECR discharge; Planar ECR plasma source; Tungsten films

Indexed keywords

ADHESION; AMORPHOUS FILMS; ANTENNAS; ARGON; COATINGS; CURRENT DENSITY; DEPOSITION; INTERMETALLICS; IRRADIATION; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; PLASMAS; TUNGSTEN;

COATING DEPOSITION; ECR DISCHARGE; PLANAR ECR PLASMA SOURCE; TUNGSTEN FILMS;

THIN FILMS;

EID: 33747756790     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.01.032     Document Type: Article

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