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Journal of Applied Physics

Volumn 63, Issue 7, 1988, Pages 2260-2266

Large grain polycrystalline silicon by low-temperature annealing of low-pressure chemical vapor deposited amorphous silicon films

(2) Hatalis, Miltiadis K a Greve, David W a

a CARNEGIE MELLON UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33747286911 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.341065 Document Type: Article

Times cited : (284)

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