Engineering strained silicon-looking back and into the future

IEEE Potentials

Volumn 25, Issue 4, 2006, Pages 31-34

  Acosta, Tony ^a   Sood, Sumant ^b,c  

^a Belford Research Inc   (United States)

^b NATIONAL SCIENCE FOUNDATION   (United States)

^c IEEE

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL TENSILE STRAINS; INTERATOMIC DISTANCES; SUBSTRATE STRAINS; WAFERS;

CMOS INTEGRATED CIRCUITS; CRYSTALLOGRAPHY; INTEGRATED CIRCUITS; MICROPROCESSOR CHIPS; STRAIN CONTROL; TENSILE STRESS; TRANSISTORS; WSI CIRCUITS;

SILICON;

EID: 33747281776     PISSN: 02786648     EISSN: None     Source Type: Journal    
DOI: 10.1109/MP.2006.1664067     Document Type: Review

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