Reduction of NO x/SO2 by wire-plate type pulsed discharge reactor with pulsed corona radical shower

Plasma Chemistry and Plasma Processing

Volumn 26, Issue 5, 2006, Pages 443-454

  Shang, Ke Feng ^a   Wu, Yan ^a   Li, Jie ^a   Li, Guo Feng ^a   Li, Duan ^a   Wang, Ning Hui ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Additive; Corona radical shower; deNOx deSO 2; OH radical; Pulsed corona discharge

Indexed keywords

ADDITIVES; CHEMICAL REACTORS; COST EFFECTIVENESS; ELECTRIC REACTORS; ELECTRODES; INDUSTRIAL APPLICATIONS; NITROGEN REMOVAL; NOZZLES; REDUCTION; SPECTRUM ANALYSIS;

CORONA RADICAL SHOWER; DENOXDESO2; OH RADICAL; PULSED CORONA DISCHARGE;

NITROGEN OXIDES;

EID: 33747270065     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-006-9026-2     Document Type: Article

References (26)

1. Ma H, Chen P, Zhang M, Lin X, Ruan R (2002) Plasma Chem Plasma Process 22:239
2. Nagaoa I, Nishidaa M, Yukimuraa K, Kambarab S, Maruyama T (2002) Vacuum 65:481
3. Masuda S, Hosokawa S. Tu XL, Sakakibara K. Kitoh S, Sakai S (1993) IEEE Trans Ind Appl 29:781
4. Mizuno A, Yamazaki Y, Ito H, Yoshida H (1992) IEEE Trans Ind Appl 28:535
5. Clements JS, Mizuno A, Finney WC, Davis RH (1989) IEEE Trans Ind Appl 25:62
6. Masuda S, Nakao H (1990) IEEE Trans Ind Appl 26:374
7. Dinelli G, Civitano L, Rea M (1990) IEEE Trans Ind Appl 25:535
8. Li J, Wu Y, Wang NH, Li GF, Huang QN (2003) IEEE Trans Plasma Sci 31:333
9. Lee YH, Jung WS, Choi YR, Oh JS, Jang SD, Son YG, Cho MH, Nam KW, Koh DJ, Mok YS, Chung JW (2003) Environ Sci Technol 37:2563
10. Filimonova EA, Kim YH, Hong SH, Song YH (2002) J Phys D: Appl Phys 35:2795
11. Shin HH, Yoon WS (2003) Plasma Chem Plasma Process 23:681
12. Kinoshita Y, Ikeda H, Takashima K, Katsura S, Mizuno A (2004) IEEE Conf Rec IAS Annu Meet 1:693
13. Kinoshita Y, Saito K, Takashima K, Katsura S, Mizuno A (2001) IEEE Conf Rec IAS Annu Meet 1:693
14. Yang CL (1999) Environ Prog 18:80
15. Ohkubo T, Kanazawa S, Nomoto Y, Chang JS, Adachi T (1994) IEEE Trans Ind Appl 30:856
16. Urashima K, Chang JS, Park JY, Lee DC, Chakrabarti A, Ito T (1998) IEEE Trans Ind Appl 34:934
17. Yan KP, Yamamoto T, Kanazawa S, Ohkubo T, Nomoto Y, Chang JS (2001) IEEE Trans Ind Appl 37:1499
18. Park JY, Tomicic T, Round GF, Chang JS (1999) J Phys D: Appl Phys 32:1006
19. Roh HS, Park YK, Park SE (2000) Chem Lett 5:578
20. Chang JS, Looy PC, Pevler J, Yoshioka T, Nagai K (1993) Conf Rec IAS Annu Meet 3:1969
21. Wu Y, Li J, Wang NH, Li OF (2003) J Electrostatics 57:233
22. Babaeva NY, Naidis GV (1998) IEEE Trans Plasma Sci 26:41
23. Ershov A, Borysow J (1995) J Phys D: Appl Phys 28:68
24. Lowke JJ, Morrow R (1995) IEEE Trans Plasma Sci 23:661
25. Hoard J, Wallington TJ, Bretz RL, Malkin A, Dorai R, Kushner MJ (2003) Int J Chem Kinet 35:231
26. Kim DJ, Choi Y, Kim KS (2001) Plasma Chem Plasma Process 21:625