High-silicon steel produced by hot dipping and diffusion annealing

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7857-7859

  Ros Yanez T ^a   Houbaert, Y ^a   Gomez Rodriguez V ^b  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF VALLADOLID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL ROLLING; DIFFUSION ANNEALING; FE-SI-AL; HIGH SI CONTENT; HIGH-SILICON STEEL; HOLDING TIME; HOMOGENEOUS CONCENTRATION; HOMOGENISATION; HOT DIPPING; HYPEREUTECTIC BATH; PRIMARY SILICON; PRODUCTION ROUTE; SI CONTENT; TERNARY INTERMETALLICS; THIN SHEET;

ALUMINUM; ANNEALING; DIFFUSION; INTERMETALLICS; MAGNETIC PROPERTIES; SILICON STEEL; SIMULATORS;

SILICON;

EID: 33747053905     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1449445     Document Type: Article

References (5)

1. K. Okada, T. Yamaji, and K. Kasai, ISIJ Int. 36, 706 (1996). iit IINTEY 0915-1559
2. T. Ros-Yanez, Y. Houbaert, O. Schneeweiss, J. Asencio, and M. Prado, Rev. Metal. Madrid 36, 339 (2000).
3. T. Ros and Y. Houbaert, deposited patent in U.K. and U.S., 2001.
4. T. Ros, Y. Houbaert, O. Fischer, and J. Schneider, IEEE Trans. Magn. 37, 2321 (2001). emg IEMGAQ 0018-9464
5. L. Dupré, S. Jacobs, and J. Melkebeek, IEEE Trans. Magn. 36, 3093 (2000). emg IEMGAQ 0018-9464