High precision measurement of the 32SH electron affinity by laser detachment microscopy

Journal of Molecular Spectroscopy

Volumn 239, Issue 1, 2006, Pages 11-15

  Chaibi, Walid ^a   Delsart, Christian ^a   Drag, Cyril ^a   Blondel, Christophe ^a  

^a LABORATOIRE AIMÉ COTTON   (France)

Author keywords

Electron affinity; Electron interference; Photodetachment

Indexed keywords

DYE LASERS; ELECTRONS; ENERGY GAP; INTERFEROMETERS; OPTICAL MICROSCOPY; PHASE TRANSITIONS;

ELECTRON AFFINITY; ELECTRON INTERFERENCE; LASER DETACHMENT MICROSCOPY; PHOTODETACHMENT;

NEGATIVE IONS;

EID: 33747041932     PISSN: 00222852     EISSN: 1096083X     Source Type: Journal    
DOI: 10.1016/j.jms.2006.05.012     Document Type: Article

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