Freestanding (100) homoepitaxial CVD diamond

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 508-512

  Bogdan, G ^a   Nesladek M ^a,b,c   D'Haen, J ^a,b   Haenen, K ^a,b   D'Olieslaeger, M ^a,b  

^a HASSELT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

^c DIF   (France)

Author keywords

Diamond growth and characterization; Freestanding thick CVD diamond films; Oxygen plasma pre treatment; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; METHANE; OPTICAL MICROSCOPY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

DIAMOND GROWTH AND CHARACTERIZATION; FREESTANDING THICK CVD DIAMOND FILMS; MEAN ROUGHNESS (RMS); OXYGEN PLASMA PRE-TREATMENT;

DIAMONDS;

EID: 33746953493     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.059     Document Type: Article

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