The neural network implementation in pattern recognition of semiconductor etching process

Journal of the Chinese Institute of Industrial Engineers

Volumn 23, Issue 4, 2006, Pages 269-279

  Chen, Wen Chin ^a   Chen, Chen Tai ^a   Tsai, Chih Hung ^b   Ho, Tsung Hsuan ^a  

^a CHUNG HUA UNIVERSITY   (Taiwan)

^b TA HWA INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

Back propagation neural network; Curve recognition; Endpoint curve; Etching process; Semiconductor manufacturing

Indexed keywords

DATABASE SYSTEMS; ETCHING; LEARNING SYSTEMS; PATTERN RECOGNITION; REAL TIME SYSTEMS; SEMICONDUCTOR DEVICES;

BACK-PROPAGATION NEURAL NETWORK; CURVE RECOGNITION; ENDPOINT CURVE; ETCHING PROCESS; SEMICONDUCTOR MANUFACTURING;

NEURAL NETWORKS;

EID: 33746899665     PISSN: 10170669     EISSN: 21517606     Source Type: Journal    
DOI: 10.1080/10170660609509323     Document Type: Article

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