Micro-rapid-prototyping via multi-layered photo-lithography

International Journal of Advanced Manufacturing Technology

Volumn 29, Issue 9-10, 2006, Pages 1026-1032

  Thian, S C H ^a   Tang, Y ^a   Fuh, J Y H ^a   Wong, Y S ^a   Lu, L ^a   Loh, H T ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Micro fabrication; Photolithography; Photomask; Photopolymer; Rapid prototyping

Indexed keywords

FABRICATION; INTEGRATED CIRCUITS; LIGHT SOURCES; MACHINING; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS); MICRO-FABRICATION; PHOTOMASK; PHOTOPOLYMER;

RAPID PROTOTYPING;

EID: 33746889038     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-005-2620-2     Document Type: Article

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