Modeling magnetron sputter deposition

Materials and Manufacturing Processes

Volumn 21, Issue 6, 2006, Pages 628-633

  Johnson, Mark ^a   Cote, Paul ^a  

^a Benet Laboratories   (United States)

Author keywords

Atomic force microscopy; Dynamic scaling; Modeling; Sputter deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MICROSTRUCTURE; OPTIMIZATION;

DYNAMIC EXPONENT; DYNAMIC SCALING; MODELING;

SPUTTER DEPOSITION;

EID: 33746786387     PISSN: 10426914     EISSN: 15322475     Source Type: Journal    
DOI: 10.1080/10426910600611045     Document Type: Article

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